Micro/Nano Fabrication Back to research list

Overview

For many micro systems, complex geometries are required to increase their capabilities. Typically, three-dimensional microfabrication technologies use many fabrication steps and many photolithographic masks to realize these systems. The VT MEMS lab is working on fabrication techniques which enable these same geometries with a single photolithographic mask and a single substrate etch. This greatly decreases the cost of creating microsystems, thus making MEMS technologies more economically viable. Our aim is to develop such single-mask 3D structures on a variety of substrates including silicon, glass, and elastomers. When made on silicon, a high level of integration is possible due to the fact that our process is CMOS compatible. We are utilizing these novel fabrication technologies in other research thrusts in our lab. In addition, our group is working on integration of MEMS and nanotechnology to serve our micro analytical instrument thrust.